2'' wafer CVD monolayers or few-layers 2'' wafer CVD monolayers or few-layers 2'' wafer CVD monolayers or few-layers 2'' wafer CVD monolayers or few-layers 2'' wafer CVD monolayers or few-layers 2'' wafer CVD monolayers or few-layers 2'' wafer CVD monolayers or few-layers

2'' wafer CVD monolayers or few-layers

$1,190.00

2 inch full area coverage MoS2, MoSe2, WS2, WSe2 monolayers (few-layers are available on request) on 2 inch size c-cut sapphire substrates. CVD TMDs are all highly luminescent and Raman spectroscopy studies also confirm the monolayer thickness.

Growth method: Our company synthesizes these monolayers using chemical vapor deposition (CVD) using highest purity (6N) gases and precursors in semiconductor grade facilities to produce crystalline and large domain size samples (1-50um). This is unlike commonly used MOCVD process wherein defects are very very large and domain sizes are small (10nm-500nm). Our samples are always highly luminescent, highly crystallized and does not contain carbon contaminant layer

Sample Properties

Sample size 2'' wafer size
Substrate type (0001) c-cut sapphire
Coverage Full Coverage Monolayer MoS2, WS2, MoSe2, and WSe2
Electrical properties Direct Bandgap Excitonic Semiconductor
Crystal structure Hexagonal Phase
Unit cell parameters Depends on the type selected
Production method Low pressure chemical vapor deposition (LPCVD)
Characterization methods Raman, photoluminescence, TEM, EDS

Specification.

  • Identification. Full coverage 100% monolayer (few-layers are available on request) uniformly covered across c-cut sapphire
  • Physical dimensions. World's largest size 2'' diameter monolayers on sapphire.
  • Smoothness. Atomically smooth surface with roughness < 0.15 nm.
  • Uniformity. Highly uniform surface morphology. TMDs monolayers (few-layers are available on request) uniformly cover across the sample.
  • Purity. 99.9995% purity as determined by nano-SIMS measurements
  • Reliability. Repeatable Raman and photoluminescence response
  • Crystallinity. High crystalline quality, Raman response, and photoluminescence emission comparable to single crystalline sheets.
  • Substrate. c-cut Sapphire
  • Support. 2Dsemiconductors USA is an American owned, regulated, and operated company. Our customers are well-protected by international as well as strict American customer laws and regulations. We give full technical support and guarantee your satisfaction with our well-established customer service
  • Defect profile. TMDs monolayers do not contain intentional dopants or defects. However, our technical staff can produce defected TMDs using a-bombardment technique.
Full Description
Formula: MoS2, WS2, WSe2, MoSe2
Qty
  • Description

    2 inch full area coverage MoS2, MoSe2, WS2, WSe2 monolayers (few-layers are available on request) on 2 inch size c-cut sapphire substrates. CVD TMDs are all highly luminescent and Raman spectroscopy studies also confirm the monolayer thickness.

    Growth method: Our company synthesizes these monolayers using chemical vapor deposition (CVD) using highest purity (6N) gases and precursors in semiconductor grade facilities to produce crystalline and large domain size samples (1-50um). This is unlike commonly used MOCVD process wherein defects are very very large and domain sizes are small (10nm-500nm). Our samples are always highly luminescent, highly crystallized and does not contain carbon contaminant layer

    Sample Properties

    Sample size 2'' wafer size
    Substrate type (0001) c-cut sapphire
    Coverage Full Coverage Monolayer MoS2, WS2, MoSe2, and WSe2
    Electrical properties Direct Bandgap Excitonic Semiconductor
    Crystal structure Hexagonal Phase
    Unit cell parameters Depends on the type selected
    Production method Low pressure chemical vapor deposition (LPCVD)
    Characterization methods Raman, photoluminescence, TEM, EDS

    Specification.

    • Identification. Full coverage 100% monolayer (few-layers are available on request) uniformly covered across c-cut sapphire
    • Physical dimensions. World's largest size 2'' diameter monolayers on sapphire.
    • Smoothness. Atomically smooth surface with roughness < 0.15 nm.
    • Uniformity. Highly uniform surface morphology. TMDs monolayers (few-layers are available on request) uniformly cover across the sample.
    • Purity. 99.9995% purity as determined by nano-SIMS measurements
    • Reliability. Repeatable Raman and photoluminescence response
    • Crystallinity. High crystalline quality, Raman response, and photoluminescence emission comparable to single crystalline sheets.
    • Substrate. c-cut Sapphire
    • Support. 2Dsemiconductors USA is an American owned, regulated, and operated company. Our customers are well-protected by international as well as strict American customer laws and regulations. We give full technical support and guarantee your satisfaction with our well-established customer service
    • Defect profile. TMDs monolayers do not contain intentional dopants or defects. However, our technical staff can produce defected TMDs using a-bombardment technique.