Ti3N4 is MXene material. Our production line gives a special emphasis to reducing the etching rate and eliminating secondary MAX phases in order that 100% pure, perfectly layered, and purity higher than 99.999% can be achieved. The entire process starts from the MAX precursor and finalized with Ti3N4 after pulsed NaF-HCl etching process. These MXenes have many important applications in battery, storage, catalysis, magnetism, and electronics. Each order contains 250mg of Ti3N4 vdW crystallites.