ZnPS3 crystal ZnPS3 crystal structure

ZnPS3

SKU: blk-ZnPS3
$590.00

The only commercially available ZnPS3 vdW crystals with excellent environmental stability and exfoliation characteristics.

ZnPS3 is a layered materials belonging to the 2D phosphosulfide family group with the general formula MPX3 where M=Zn and X=S. ZnPS3 crystallizes in monoclinic, space group C2/m. It has thepretically calculated band gap of 2.1eV while experimental value is expected to be larger. It has been suggested as photocatalytic and catalytic materials and more recently as 2D magnetic system though its magnetic properties remain largely unestablished. 

The properties of ZnPS3 vdW CVD and magnetic crystals 

Sample size Each order contains large ~cm sized crystals
Material properties 2D magnet, catalytic
Crystal structure Monoclinic; and has with a=5.97Å, b=10.34Å, c-6.75Å, β=107.14°
Degree of exfoliation easy exfoliation characteristics
Production method High electronic purity (6N or better) through self flux technique
Other characteristics
  • No transport agents 
  • Good stability
  • Low defect concentration
  • High electronic quality
Full Description
Formula: ZnPS3
Qty
  • Description

    ZnPS3

    The only commercially available ZnPS3 vdW crystals with excellent environmental stability and exfoliation characteristics.

    ZnPS3 is a layered materials belonging to the 2D phosphosulfide family group with the general formula MPX3 where M=Zn and X=S. ZnPS3 crystallizes in monoclinic, space group C2/m. It has thepretically calculated band gap of 2.1eV while experimental value is expected to be larger. It has been suggested as photocatalytic and catalytic materials and more recently as 2D magnetic system though its magnetic properties remain largely unestablished. 

    The properties of ZnPS3 vdW CVD and magnetic crystals 

    Sample size Each order contains large ~cm sized crystals
    Material properties 2D magnet, catalytic
    Crystal structure Monoclinic; and has with a=5.97Å, b=10.34Å, c-6.75Å, β=107.14°
    Degree of exfoliation easy exfoliation characteristics
    Production method High electronic purity (6N or better) through self flux technique
    Other characteristics
    • No transport agents 
    • Good stability
    • Low defect concentration
    • High electronic quality