GaS on SiO2/Si GaS on sapphire GaSe on SiO2/Si GaTe on SiO2/Si GaTe on sapphire

vdW films

$390.00

Variety of vdW layers are deposited onto sapphire, SiO2/Si, and other custom substrates. Example material systems include GaS, GaSe, GaTe, SnS, SnSe, and others. Typical substrate size measure 1cm2 with 0.5mm2 active area of 2D layers. These layered materials have been deposited using atomic layer deposition growth procedure established at our facilities between 2016-2018. All the product are rated at 6N (99.9999%) purity, defect free, electronic, and optical grade quality. Single crystal size is much larger than conventional CVD, MOCVD, or PLD techniques. 

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    Variety of vdW layers are deposited onto sapphire, SiO2/Si, and other custom substrates. Example material systems include GaS, GaSe, GaTe, SnS, SnSe, and others. Typical substrate size measure 1cm2 with 0.5mm2 active area of 2D layers. These layered materials have been deposited using atomic layer deposition growth procedure established at our facilities between 2016-2018. All the product are rated at 6N (99.9999%) purity, defect free, electronic, and optical grade quality. Single crystal size is much larger than conventional CVD, MOCVD, or PLD techniques.